00951naa a2200193 a 450000100080000000500110000800800410001910000170006024500800007726000060015752003100016365000280047365300140050165300160051565300120053165300090054370000200055277301850057210297702006-03-30               bl ---       0--  u    #d1 aALVES, C. R.  aEDX and AFM topography analysis of sol-gel SiO2 films on ceramic substrate.  c0  aDip-coating sol-gel technique was used for SiO2 film formation onto a ceramic substrate. The main aim is to form a controlled porous thin film appropriate for enzymes coupling and sensor applications. The experimental procedure followed the conventional sol-gel process form a perecursor solution of TMOS.  aatomic force microscopy  aCerâmica  aDip-coating  aSol-gel  aTMOS1 aASSIS, O. B. G.  tIn: ANNUAL MEETING & EXPOSITION, 102., 2000, St. Louis. Annual meeting abstracts: gateway to the new milennium: abstract book... Westerville: American Ceramic Society, 2000. p.164.