01150naa a2200193 a 450000100080000000500110000800800410001910000200006024501310008026000090021152004890022065300080070965300080071765300100072570000200073570000300075570000270078577301440081210294362006-02-01       2005    bl ---       0--  u    #d1 aSOUZA, A. L. de  aTailoring surfaces using aminoalkoxysilanes and phosphotungstic acid, characterized by the use of the atomic force microscopy.  c2005  aIn the earlier 80's the pioneer work of Sagiv has introduced the formation of self-assembly monolayer (SAM) with siloxane compounds [1], opening a whole new area for the application of these compounds. A wide variety of organosilanes has been used in the chemical modification of the surfaces aminopropyltriethoxysilane (APTS), N-(3-(trimethoxysilyl)-propyl)-ethylenodiamine (TSPEN) and their hybrid fulms with 12-tugstophosphoric acid on oxidized silicon wafer surface, SiO2/Si(100).  aAFM  aSAM  aTSPEN1 aLEITE, F. de L.1 aHERRMANN JUNIOR, P. S. P.1 aRODRIGUES FILHO, U. P.  tIn: LATIN AMERICAM SYMPOSIUM ON SCANNING PROBE MICROSCOPY, 3., 2005, Ouro Preto. [Anais eletrônicos...]. Ouro Preto: SBMN, 2005. 1 CD-ROM.