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Registro Completo |
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Biblioteca(s): |
Embrapa Instrumentação. |
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Data corrente: |
21/08/2003 |
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Data da última atualização: |
24/02/2010 |
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Autoria: |
CARVALHO, A. T.; CARVALHO, A. M.; SILVA, M. L. P.; DEMARQUETTE, N. R.; ASSIS, O. B. G. |
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Afiliação: |
Embrapa Instrumentação Agropecuária, São Carlos, SP. |
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Título: |
Evaluation of organosilicon combined deposition for hydrophobic coatings of beans. |
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Ano de publicação: |
2002 |
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Fonte/Imprenta: |
In: MATTOSO, L. H. C.; LEÃO, A.; FROLLINI, E. (Ed.). Natural polymers and compósites IV. [São Carlos: EMBRAPA: USP; S.l.: UNESP, 2002]. 4 f. 1 CD-ROM. |
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Idioma: |
Inglês |
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Conteúdo: |
Three different wet and cold-plasma treatments were used in order to create hydrophobic layers on beans surface. Hexamethyldisilazane (HDMS) was the precursor solution for based organosilicon composition film formation. Structures such as SiCH3 and Si2CH2 were identified as composing the surface after plasma treatments. Ultra-violet exposure promoted corsslinking in the polymeric film but no interference in hydrophobic properties was found. Combination of HDMS vapor plus 5 minutes plasma showed the best result in avoiding beans germination in wet environmental condition. |
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Palavras-Chave: |
Coated beans; Cold plasma; Moisture barrier; Organosilicon layers. |
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Categoria do assunto: |
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Marc: |
LEADER 01298naa a2200217 a 4500
001 1024755
005 2010-02-24
008 2002 bl --- 0-- u #d
100 1 $aCARVALHO, A. T.
245 $aEvaluation of organosilicon combined deposition for hydrophobic coatings of beans.
260 $c2002
520 $aThree different wet and cold-plasma treatments were used in order to create hydrophobic layers on beans surface. Hexamethyldisilazane (HDMS) was the precursor solution for based organosilicon composition film formation. Structures such as SiCH3 and Si2CH2 were identified as composing the surface after plasma treatments. Ultra-violet exposure promoted corsslinking in the polymeric film but no interference in hydrophobic properties was found. Combination of HDMS vapor plus 5 minutes plasma showed the best result in avoiding beans germination in wet environmental condition.
653 $aCoated beans
653 $aCold plasma
653 $aMoisture barrier
653 $aOrganosilicon layers
700 1 $aCARVALHO, A. M.
700 1 $aSILVA, M. L. P.
700 1 $aDEMARQUETTE, N. R.
700 1 $aASSIS, O. B. G.
773 $tIn: MATTOSO, L. H. C.; LEÃO, A.; FROLLINI, E. (Ed.). Natural polymers and compósites IV. [São Carlos: EMBRAPA: USP; S.l.: UNESP, 2002]. 4 f. 1 CD-ROM.
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Registro original: |
Embrapa Instrumentação (CNPDIA) |
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