01298naa a2200217 a 450000100080000000500110000800800410001910000200006024500870008026000090016752005840017665300170076065300160077765300210079365300250081470000200083970000200085970000230087970000200090277301580092210247552010-02-24       2002    bl ---       0--  u    #d1 aCARVALHO, A. T.  aEvaluation of organosilicon combined deposition for hydrophobic coatings of beans.  c2002  aThree different wet and cold-plasma treatments were used in order to create hydrophobic layers on beans surface. Hexamethyldisilazane (HDMS) was the precursor solution for based  organosilicon composition film formation. Structures such as SiCH3 and Si2CH2 were identified as composing the surface after plasma treatments. Ultra-violet exposure promoted corsslinking in the polymeric film but no interference in hydrophobic properties was found. Combination of  HDMS vapor plus 5 minutes plasma showed the best result in avoiding beans germination in wet environmental condition.  aCoated beans  aCold plasma  aMoisture barrier  aOrganosilicon layers1 aCARVALHO, A. M.1 aSILVA, M. L. P.1 aDEMARQUETTE, N. R.1 aASSIS, O. B. G.  tIn: MATTOSO, L. H. C.; LEÃO, A.; FROLLINI, E. (Ed.). Natural polymers and compósites IV. [São Carlos: EMBRAPA: USP; S.l.: UNESP, 2002]. 4 f. 1 CD-ROM.